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6 edition of Effect of Disorder and Defects in Ion-Implanted Semiconductors found in the catalog.

Effect of Disorder and Defects in Ion-Implanted Semiconductors

Optical and Photothermal Characterization, Volume 46 (Semiconductors and Semimetals)

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  • 37 Currently reading

Published by Academic Press .
Written in English

    Subjects:
  • Condensed matter physics (liquids & solids),
  • Electricity, magnetism & electromagnetism,
  • Science/Mathematics,
  • Semiconductors,
  • Technology,
  • Science,
  • Engineering - Electrical & Electronic,
  • Electronics - Semiconductors,
  • Physics,
  • Science / Physics,
  • Technology / Material Science,
  • Technology-Electronics - Semiconductors,
  • Technology-Engineering - Electrical & Electronic

  • Edition Notes

    ContributionsConstantinos Christofides (Editor), Gerard Ghibaudo (Editor), Robert K. Willardson (Series Editor), Eicke R. Weber (Series Editor)
    The Physical Object
    FormatHardcover
    Number of Pages316
    ID Numbers
    Open LibraryOL9284092M
    ISBN 100127521461
    ISBN 109780127521466

    page 1 1 ion implantation induced defect formation and amorphization in the group iv semiconductors: diamond, silicon and germanium by diane p. hickey a dissertation presented to the graduate school of the university of flor ida in partial fulfillment of the requirements for the degree of doctor of philosophy university of florida Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization ¦ Semiconductors and Semimetals, v (Elsevier) Effect of Long Term Thermal Exposure on Plastics and Elastomers (Elsevier) Effect of Sterilization Methods on Plastics and Elastomers Second Edition, (Elsevier).

    @article{osti_, title = {Effect of Helium implantation on gettering and electrical properties of 4H-SiC epilayers}, author = {Biondo, Stephane and Regula, Gabrielle and Ottaviani, Laurent and Palais, Olivier and Pichaud, Bernard}, abstractNote = {This paper tests the gettering ability of sites created by He implantation in 4H-SiC while heating the sample or not, and their impact on. Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization SEMICONDUCTORS AND SEMIMETALS Volume 46 Semiconductors and Semimetals A Treatise Edited by R. K.

    Ion Implantation-Induced Layer Splitting of Semiconductors Ge, gate length of the sSiGe based CMOS devices and bandgap in base region of the SiGe heterojunction bipolar transistors (HBTs) varies accordingly which gives its importance in the said applications. The typical value of Ge composition in the SiGe alloy ranges between 15–30% of Size: 5MB. trical activation, and superlattice mixing in ion-implanted GaAs. The sources of ion-implantation-related defects in Si and GaAs have been investigated for a number of years. For silicon studies, this culminated in a five category clas- sification scheme for defects based on their origin3 Type-I.


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Effect of Disorder and Defects in Ion-Implanted Semiconductors Download PDF EPUB FB2

Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be cturer: Academic Press.

Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization Edited by Constantinos Christofides, Gérard Ghibaudo Volume Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physicochemical Characterization.

Edited by Gerard Ghibaudo. Receive an update when the latest chapters in this book series are published. Sign in to set up alerts. select article Volume Editors. Purchase Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization, Volume 46 - 1st Edition.

Print Book & E-Book. ISBNISBN: OCLC Number: Description: xix, pages: illustrations ; 24 cm. Contents: Ch.

Ion implantation into semiconductors: Historical perspectives --ch. onic stopping power for energetic ions in solids --ch.

effect on the electronic stopping of crystalline target and application to range estimation --ch. Effect of disorder and defects in ion-implanted semiconductors: optical and photothermal characterization.

Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization: Volume 46 by Robert K. Willardson,available at Book Depository with free delivery worldwide.

Get this from a library. Effect of disorder and defects in ion-implanted semiconductors: electrical and physicochemical characterization. [Gérard Ghibaudo; Constantinos Christofides;] -- Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations.

Effect Of Disorder And Defects In Ion Implanted Semiconductors Optical And Photothermal CharacterizaWith an OverDrive account, you can save your favorite libraries for at-a-glance information about availability.

Parameters obtained by fitting dissociative adsorption model and neglecting any desorption process. Institutional Subscription/5(K). Find many great new & used options and get the best deals for Semiconductors and Semimetals: Effect of Disorder and Defects in Ion-Implanted Semiconductors Vol.

Optical and Photothermal Characterization Volume 46 (, Hardcover) at the best online. The book Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization: 46 (Semiconductors and Semimetals) ended up being making you to know about other understanding and of course you can take more information.

Description: Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed.

Disorder in Ion Implanted Silicon. Anomalous Diffusion of Defects in Ion-Implanted GaAs. Vook, S. Picraux. Pages International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in in Thousand Oaks, California.

Although ori­ ginally. Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization, Volume 46 by Robert K. Willardson (Editor), Gerard Ghibaudo (Editor).

Ion implantation was first applied to semiconductors over 30 years ago as a means of introducing controllable concentrations of n- and p-type dopants at precise depths below the surface. The ion-channelling effect is definitely influenced by the quality of the crystal, which can be modified depending on the implanted-ion mass, energy and ion fluence by point defects, introduced.

Lattice disorder was studied in ion implanted GaAs as a function of implant and anneal temperature by proton channeling effect measurements. Nonchanneled 85 keV 16 O + implants were made near to the axis into the A(Ga) or B(As) by: 9. The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication.

This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials.

The First. journal title abbreviations. effect of disorder and defects in ion-implanted semiconductors: electrical and physicochemical characterization effect of disorder and defects in ion-implanted semiconductors: optical and photothermal characterization semiconduct semimet. In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors.

It would be impos­ sible not to note the growing interest in this field, both by research groups and those directly concerned with production of : Springer-Verlag Berlin Heidelberg.

induced defects are caused by the implanted atom as it comes to rest in the semiconductor. Al- though between ion implanted and fast neutron irradiated silicon (16). Most of the gross disorder anneals "Ion Implantation in Semiconductors,'I Academic Press, New York File Size: KB.

3D lattice distortions and defect structures in ion-implanted nano-crystals. It is interesting to consider the effect of these defects on the average strains induced by FIB by: Enjoy millions of the latest Android apps, games, music, movies, TV, books, magazines & more.

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